Characterization of particle motion for polishing and texturing under AC field by using particle dispersion type ER fluid

The authors have already proposed a new method of polishing using particle dispersion type ER fluid. And also have applied this method for polishing m icro hole in a ceramic disk. In this paper, we characterize the particle di spersion type ER fluid and particle motion suitable for polishing and textu ring. We selected the type of abrasive material to be used in ER fluid base d on theoretical calculation of the force exerted by an individual particle under alternative electric field. And also, we have experimentally obtaine d the force generated by ER fluid dispersing diamond particles of different size range, concentrations and dispersing media with different viscosity. Furthermore, we have observed the particle response using a high-speed vide o camera.