The real origin of lognormal size distributions of nanoparticles in vapor growth processes

Citation
Lb. Kiss et al., The real origin of lognormal size distributions of nanoparticles in vapor growth processes, NANOSTR MAT, 12(1-4), 1999, pp. 327-332
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
NANOSTRUCTURED MATERIALS
ISSN journal
09659773 → ACNP
Volume
12
Issue
1-4
Year of publication
1999
Part
A
Pages
327 - 332
Database
ISI
SICI code
0965-9773(199907)12:1-4<327:TROOLS>2.0.ZU;2-L
Abstract
In modern nanoparticle production methods, such as inert-gas evaporation, a strong effort is made to avoid coagulation of particles. Therefore, the cl assical coagulation models are not suitable for predicting the particle siz e distribution. This paper presents a new model that explains lognormal par ticle size distributions from first principles in a physically realistic wa y, without coagulation. The model is completely different from the previous ly applied growth models; it is based on a random residence time approach, where the time available for the particles to grow is random and determines the size distribution. The model is generally relevant in fields such as n anoparticle physics, aerosol science, environmental science and fractal gro wth, whenever particle growth occurs during transport through a growth zone due to diffusion and drift. Predictions made from the model agree with pub lished experimental data obtained with the inert-gas evaporation technique. (C) 1999 Acta Metallurgica Inc.