We conducted tensile rests of free standing Al/Ti multilayer thin films in
order to determine the dependence of yield stress on layer thickness. The m
ultilayers studied were composed of fcc and hcp Ti layers. The Al layers we
re approximately twice the thickness of the Ti layers. Because a controvers
y exists concerning the crystalline structure of Ti in Al/Ti multilayers, w
e also present microstructural results. (C) 1999 Acta Metallurgica Inc.