Fourier Transform Infrared Spectroscopy has been used to study the bond res
tructuring in silicon and oxygen irradiated porous silicon. Boron doped p-t
ype (111) porous silicon was irradiated with 10 MeV silicon and a 14 MeV ox
ygen ions at different doses ranging between 10(12) and 10(14) ions cm(-2).
The yield of PL in porous silicon irradiated samples was observed to incre
ase considerably while in oxygen irradiated samples it was seen to improve
only by a small extent for lower doses whereas it decreased for higher dose
s. The results were interpreted in view of the relative intensities of the
absorption peaks associated with O-Si-H and Si-H stretch bonds. (C) 1999 El
sevier Science B.V. All rights reserved.