FTIR studies of swift silicon and oxygen ion irradiated porous silicon

Citation
Tm. Bhave et al., FTIR studies of swift silicon and oxygen ion irradiated porous silicon, NUCL INST B, 156(1-4), 1999, pp. 121-124
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
156
Issue
1-4
Year of publication
1999
Pages
121 - 124
Database
ISI
SICI code
0168-583X(199907)156:1-4<121:FSOSSA>2.0.ZU;2-1
Abstract
Fourier Transform Infrared Spectroscopy has been used to study the bond res tructuring in silicon and oxygen irradiated porous silicon. Boron doped p-t ype (111) porous silicon was irradiated with 10 MeV silicon and a 14 MeV ox ygen ions at different doses ranging between 10(12) and 10(14) ions cm(-2). The yield of PL in porous silicon irradiated samples was observed to incre ase considerably while in oxygen irradiated samples it was seen to improve only by a small extent for lower doses whereas it decreased for higher dose s. The results were interpreted in view of the relative intensities of the absorption peaks associated with O-Si-H and Si-H stretch bonds. (C) 1999 El sevier Science B.V. All rights reserved.