Modeling scatter from silicon wafer features based on discrete sources method

Authors
Eremin, YA Stover, JC Orlov, NV
Citation
Ya. Eremin et al., Modeling scatter from silicon wafer features based on discrete sources method, OPT ENG, 38(8), 1999, pp. 1296-1304
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICAL ENGINEERING
ISSN journal
00913286 → ACNP
Volume
38
Issue
8
Year of publication
1999
Pages
1296 - 1304
Database
ISI
SICI code
0091-3286(199908)38:8<1296:MSFSWF>2.0.ZU;2-H
Abstract
The discrete sources method (DSM) is extended to investigate complete mathe matical models for light scattering from various kinds of silicon wafers fe atures. Computer simulations demonstrate the usefulness of the DSM for comp aring scatter signals associated with different surface features. Wafer fea tures such as contaminating particles, subsurface defects and pits are inve stigated. (C) 1999 Society of Photo-Optical Instrumentation Engineers.