High-pressure x-ray absorption study of InSe

Citation
J. Pellicer-porres et al., High-pressure x-ray absorption study of InSe, PHYS REV B, 60(6), 1999, pp. 3757-3763
Citations number
40
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
6
Year of publication
1999
Pages
3757 - 3763
Database
ISI
SICI code
0163-1829(19990801)60:6<3757:HXASOI>2.0.ZU;2-O
Abstract
The III-VI layered semiconductor InSe has been studied by high-pressure sin gle crystal x-ray absorption spectroscopy up to a maximum pressure of 14 GP a. The In-Se distance has been measured in both the low-pressure layered ph ase and the high-pressure NaCl phase. The bond compressibility in the layer ed phase is lower than the "a" crystallographic parameter compressibility, which implies an increase of the angle between the In-Se bond and the layer plane. Under plausible hypothesis, a description of the evolution of the w hole structure with pressure is given. In particular, the intralayer distan ce is observed to increase with increasing pressure. A plausible precursor defect and a simple mechanism for the transition are also presented. The co nclusions can be readily translated to other III-VI layered semiconductors. [S0163-1829(99)07729-2].