Supersonic pulse, plasma sampling mass spectrometry is described, with an e
mphasis on the physical mechanism by which species originally within the pl
asma are incorporated into the supersonically expanding noble gas pulse. Th
is new method is based on the release of a short burst of noble gas into th
e high vacuum environment of an ECR-microwave plasma. Upon expansion throug
h the plasma region, species originally present in the plasma become incorp
orated in the noble gas pulse and are detected by quadrupole mass spectrome
try. The mechanism of the incorporation process is investigated through mea
surement of the time-of-flight velocity distributions of both the noble gas
and species incorporated into the pulse. Incorporation is shown to be the
result of supercooled noble gas clustering around the incorporated species,
which act as nucleation sites for the condensation. It is this unique samp
ling method which makes this technique capable of providing a chemical snap
shot of the plasma composition. Practical applications of this technique in
clude the investigation of the composition of diamond deposition plasmas an
d the etching of silicon with chlorine. The investigations of diamond plasm
as include the observation of a plasma that contains at least 40% of the ra
dical species C2H3.