Ap. Chojnacka et al., The thermal diffusivity of silicon nitride/silicon carbide nanocomposites using a photothermal deflection technique, P ROY SOC A, 455(1988), 1999, pp. 2781-2802
Citations number
54
Categorie Soggetti
Multidisciplinary
Journal title
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES
Measurements are presented to show the effect of mass fraction on thermal d
iffusivity of composites fabricated from 200 nm silicon carbide particles d
ispersed in a matrix of silicon nitride. The mean composite thermal diffusi
vity is measured over a mass fraction range of 0.05 to 0.30 using a phototh
ermal deflection technique which creates a frequency-dependent thermal pene
tration depth in the material that can be used to reveal local inhomogeneit
ies of thermal diffusivity. The results show that a maximum thermal diffusi
vity occurs at a mass fraction of 0.10. This peak value follows extrema in
fracture toughness and creep rate at this particle loading that had been ob
served in prior studies of similarly fabricated nanocomposites. The results
are discussed in terms of the competing influences of large thermal diffus
ivity of silicon carbide relative to silicon nitride, and the role of inter
faces as volume fraction is changed due to the high surface-to-volume ratio
of the nanosize particles. The measurements are compared with literature v
alues and the trends are explained in terms of the differing particle sizes
and binders used in the composites.