Physicochemical properties of a plasma-solution system

Authors
Kutepov, AM Zakharov, AG Maksimov, AI
Citation
Am. Kutepov et al., Physicochemical properties of a plasma-solution system, THEOR F CH, 33(4), 1999, pp. 319-324
Citations number
10
Categorie Soggetti
Chemical Engineering
Journal title
THEORETICAL FOUNDATIONS OF CHEMICAL ENGINEERING
ISSN journal
00405795 → ACNP
Volume
33
Issue
4
Year of publication
1999
Pages
319 - 324
Database
ISI
SICI code
0040-5795(199907/08)33:4<319:PPOAPS>2.0.ZU;2-3
Abstract
Cathode fall and electric-field strength were measured in a low-current ste ady-state discharge plasma between a metallic anode and an electrolyte solu tion. Ion bombardment of the solution surface causes solution evaporation a nd growth of the electrical conductivity and acidity of the solution. Plasm a-induced oxidation processes in the solution are accompanied by oscillatio n and the formation of spatial structures.