Annealing behavior of barriers in ion-implanted LiNbO3 and LiTaO3 planar waveguides

Citation
F. Lu et al., Annealing behavior of barriers in ion-implanted LiNbO3 and LiTaO3 planar waveguides, APPL OPTICS, 38(24), 1999, pp. 5122-5126
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
38
Issue
24
Year of publication
1999
Pages
5122 - 5126
Database
ISI
SICI code
0003-6935(19990820)38:24<5122:ABOBII>2.0.ZU;2-T
Abstract
We formed planar waveguides in LiNbO3 and LiTaO3 crystals by megaelectron v olt He-ion implantation. The dark modes of both waveguides are measured and their refractive-index profiles are described according to the parameteriz ed index profile reconstruction method. The extraordinary indices of both i on-implanted waveguides exhibit quite different profiles. We compare the th ermal stability of barriers in ion-implanted LiNbO3 and LiTaO3 waveguides b y annealing at different temperatures. The results show that the barrier in a LiTaO3 planar waveguide has higher thermal stability than that in a LiNb O3 waveguide. The experiments also show that annealing at a temperature hig her than 400 degrees C results in recrystallization of the barrier. (C) 199 9 Optical Society of America. OCIS codes: 130.2790, 130.3120.