True atomic resolution under ambient conditions obtained by atomic force microscopy in the contact mode

Citation
T. Schimmel et al., True atomic resolution under ambient conditions obtained by atomic force microscopy in the contact mode, APPL PHYS A, 68(4), 1999, pp. 399-402
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
68
Issue
4
Year of publication
1999
Pages
399 - 402
Database
ISI
SICI code
0947-8396(199904)68:4<399:TARUAC>2.0.ZU;2-U
Abstract
A step edge on the (0001) cleavage plane of the layered dichalcogenide 2H-n iobium diselenide (2H-NbSe2) has been investigated by contact-mode atomic f orce microscopy (AFM) in air. Both the terraces and the monolayer step itse lf were reproducibly imaged at atomic resolution in the repulsive-force reg ime at forces between tip apex and sample of the order of 10(-9) N. Several kinks were also imaged at atomic resolution. Details of the atomic registr y of subsequent Se-Nb-Se sandwich layers as well as the arrangement of the individual atoms at the kink sites were resolved. The results are in perfec t quantitative agreement with the lattice structure known from X-ray analys is and indicate that true atom-by-atom lateral resolution of microscopic de fects is feasible by AFM in the contact mode and under ambient conditions.