Fabricating tunable semiconductor devices with an atomic force microscope

Citation
R. Held et al., Fabricating tunable semiconductor devices with an atomic force microscope, APPL PHYS L, 75(8), 1999, pp. 1134-1136
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
8
Year of publication
1999
Pages
1134 - 1136
Database
ISI
SICI code
0003-6951(19990823)75:8<1134:FTSDWA>2.0.ZU;2-U
Abstract
We fabricated quantum wires of different geometries in Ga[Al]As heterostruc tures by local oxidation of the semiconductor surface with an atomic force microscope. By magnetotransport measurements at low temperatures on these w ires the electronic width is determined and compared to the geometrical wid th. An extremely small lateral depletion length of the order of 15 nm and a high specularity of the scattering at the confining walls is found. Furthe rmore, we demonstrate experimentally that these quantum wires can be tuned by a combination of in-plane gates and top gates. (C) 1999 American Institu te of Physics. [S0003-6951(99)02134-8].