Solid state amorphisation in magnetic multilayers: the interface structureand the electrical transport properties

Citation
T. Stobiecki et al., Solid state amorphisation in magnetic multilayers: the interface structureand the electrical transport properties, CHAOS SOL F, 10(12), 1999, pp. 2031-2044
Citations number
29
Categorie Soggetti
Multidisciplinary
Journal title
CHAOS SOLITONS & FRACTALS
ISSN journal
09600779 → ACNP
Volume
10
Issue
12
Year of publication
1999
Pages
2031 - 2044
Database
ISI
SICI code
0960-0779(199912)10:12<2031:SSAIMM>2.0.ZU;2-2
Abstract
The structure and electrical conductivity properties of the R.F. sputtered Fe/Zr and Fe/Ti multilayers with ultrathin layer thicknesses, in as-deposit ed states, have been studied using X-ray diffraction, low-angle X-ray and n eutron reflectometry, conversion electron Mossbauer spectroscopy (CEMS). re sistivity and magnetoresistivity measurements. The thickness ratio (beta = d(Fe)/d(Zr) and d(Fe)/d(Ti)) of analysed multilayers was 0.5 and 1, the val ues of the bilayer thickness (lambda = d(Fe) + d(Ti,Zr)) was varied from 9 Angstrom to 600 Angstrom, maintaining constant the total thickness of the s amples by controlling the number of bilayers, The results obtained from CEM -spectroscopy and X-ray diffraction show that Fe layers of the thickness be low 20 Angstrom are alloyed forming an amorphous phase during deposition. T his amorphous phase is distributed in the plant: between the crystalline su blayers as well as in the grain boundaries according with the proposed mode l of the interpretation of the electrical conductivity as a function of the bilayer thickness (lambda). (C) 1999 Elsevier Science Ltd. All rights rese rved.