T. Stobiecki et al., Solid state amorphisation in magnetic multilayers: the interface structureand the electrical transport properties, CHAOS SOL F, 10(12), 1999, pp. 2031-2044
The structure and electrical conductivity properties of the R.F. sputtered
Fe/Zr and Fe/Ti multilayers with ultrathin layer thicknesses, in as-deposit
ed states, have been studied using X-ray diffraction, low-angle X-ray and n
eutron reflectometry, conversion electron Mossbauer spectroscopy (CEMS). re
sistivity and magnetoresistivity measurements. The thickness ratio (beta =
d(Fe)/d(Zr) and d(Fe)/d(Ti)) of analysed multilayers was 0.5 and 1, the val
ues of the bilayer thickness (lambda = d(Fe) + d(Ti,Zr)) was varied from 9
Angstrom to 600 Angstrom, maintaining constant the total thickness of the s
amples by controlling the number of bilayers, The results obtained from CEM
-spectroscopy and X-ray diffraction show that Fe layers of the thickness be
low 20 Angstrom are alloyed forming an amorphous phase during deposition. T
his amorphous phase is distributed in the plant: between the crystalline su
blayers as well as in the grain boundaries according with the proposed mode
l of the interpretation of the electrical conductivity as a function of the
bilayer thickness (lambda). (C) 1999 Elsevier Science Ltd. All rights rese
rved.