Phase behaviour of non-ionic surfactant-p-xylene-water systems during the phase inversion process

Citation
M. Zerfa et al., Phase behaviour of non-ionic surfactant-p-xylene-water systems during the phase inversion process, COLL SURF A, 155(2-3), 1999, pp. 323-337
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
ISSN journal
09277757 → ACNP
Volume
155
Issue
2-3
Year of publication
1999
Pages
323 - 337
Database
ISI
SICI code
0927-7757(19990930)155:2-3<323:PBONSS>2.0.ZU;2-Y
Abstract
The present paper describes briefly the apparatus and the different experim ental techniques used to characterise the p-xylene-water-surfactant dispers ion system. Phase inversion maps for the p-xylene-water-non-ionic surfactan t system were developed. It was found that, contrary to what was previously thought, the reduction in drop size could occur during both 'stable catast rophic' and 'transitional' inversions. The presence of multiple emulsions w as also investigated. It was found that multiple emulsions present before p hase inversion could, after phase inversion, form single emulsions and vice versa. For the polyoxyethylene sorbitan monolaurate (SML) surfactants used (Tween20 and Span20), transitional inversion could occur either at low vol ume fraction or high volume fraction, leaving a gap in the middle range of water volume fraction where inversion did not occur. The gap reduced with i ncreasing SML concentration. It was also found that the transitional invers ion is not reversible when the blend Tween20/Span20 is used. For the polyox yethylene nonylphenyl ether (NPE) surfactant system (Igepal co720/Igepal co 520), transitional inversion occurred in the range of medium to high water volume fraction. The range where transitional inversion occurred, broadened when NPE concentration was increased. The application of a mixed non-ionic surfactant model to the NPE and SML systems was also investigated. (C) 199 9 Elsevier science B.V. All rights reserved.