Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings

Citation
Zm. Zeng et al., Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings, IEEE PLAS S, 27(4), 1999, pp. 1203-1209
Citations number
22
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
27
Issue
4
Year of publication
1999
Pages
1203 - 1209
Database
ISI
SICI code
0093-3813(199908)27:4<1203:IOSPOT>2.0.ZU;2-0
Abstract
Plasma immersion ion implantation (PIII) is an effective technique to enhan ce the surface properties of industrial components possessing an irregular shape. However, it is difficult to achieve uniform implantation along the g roove surface of a ball bearing. In this work, we focus on the PIII treatme nt of the are surface of an industrial ball bearing. Three practical sample placement configurations are investigated: I) direct placement on the samp le stage platen, II) placement on a copper extension with the same diameter as the bearing race, III) placement on a copper plate erected on the sampl e stage by means of a small metal rod, Using theoretical simulation, the im plant dose uniformity along the groove surface is determined for the three orientations. Our results reveal that configuration III) yields the largest implant dose along the groove surface and the dose uniformity is worse in configuration I). Hence, in order to improve the lateral dose uniformity al ong the race surface, the bearing should be elevated from the sample.