Zm. Zeng et al., Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings, IEEE PLAS S, 27(4), 1999, pp. 1203-1209
Plasma immersion ion implantation (PIII) is an effective technique to enhan
ce the surface properties of industrial components possessing an irregular
shape. However, it is difficult to achieve uniform implantation along the g
roove surface of a ball bearing. In this work, we focus on the PIII treatme
nt of the are surface of an industrial ball bearing. Three practical sample
placement configurations are investigated: I) direct placement on the samp
le stage platen, II) placement on a copper extension with the same diameter
as the bearing race, III) placement on a copper plate erected on the sampl
e stage by means of a small metal rod, Using theoretical simulation, the im
plant dose uniformity along the groove surface is determined for the three
orientations. Our results reveal that configuration III) yields the largest
implant dose along the groove surface and the dose uniformity is worse in
configuration I). Hence, in order to improve the lateral dose uniformity al
ong the race surface, the bearing should be elevated from the sample.