Electron-beam irradiation-induced nonlinearity in silicate glass films andfabrication of nonlinear optical gratings

Electron-beam (EB) irradiation on rf-sputtered silicate glass thin films ca n produce second-order nonlinearity. EB-poled germanosilicate glass film sh ows a maximum nonlinear optical (NLO) coefficient of d(33)=0.33 pm/V. It is found that the nonlinearity is homogeneous throughout the film layer and d epends on both the EB current and dose. Moreover, a NLO grating, i.e., chi( (2)) grating, is realized using a periodic EB writing technique. (C) 1999 A merican Institute of Physics. [S0021-8979(99)04217-6].