Infrared optical properties of Mn1.56Co0.96Ni0.48O4 spinel films sputter deposited in an oxygen partial pressure series

Citation
R. Dannenberg et al., Infrared optical properties of Mn1.56Co0.96Ni0.48O4 spinel films sputter deposited in an oxygen partial pressure series, J APPL PHYS, 86(5), 1999, pp. 2590-2601
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
5
Year of publication
1999
Pages
2590 - 2601
Database
ISI
SICI code
0021-8979(19990901)86:5<2590:IOPOMS>2.0.ZU;2-1
Abstract
Mn1.56Co0.96Ni0.48O4 spinel films were sputter deposited onto silicon subst rates using a series of oxygen partial pressures. Fourier transform infrare d transmission and reflectance, and Raman scattering measurements were made . The 1-25 mu m wavelength range was examined using these optical technique s. The complex index of refraction was calculated for this entire wavelengt h range. Infrared active vibrations were analyzed using multiple oscillator analysis, Kramers-Kronig analysis, and derivative reflectance spectroscopy . The Raman and infrared active lattice vibrations were observed to shift w ith increasing oxygen partial pressure during film deposition, and were con sistent with the earlier published shift in Debye frequency calculated from resistivity data. The films were shown to have an optically transparent wi ndow from 6 to 14 mu m wavelength, with the multiphonon cutoff occurring at 14 mu m. The frequency of the multiphonon cutoff was also observed to shif t to higher frequency with the oxygen partial pressure during sputtering. T hese studies, and the earlier work on the variation of the thermopower and resistivity with oxygen partial pressure and film temperature, are consiste nt with a change in the ratio of Mn3+ to Mn4+ cations with oxygen, with sma ll polaron hopping as the charge transport mechanism. (C) 1999 American Ins titute of Physics. [S0021-8979(99)01417-6].