Additive oxygen effects in Cl-2 plasma etching of chrome films

Authors
Kwon, KH Kang, SY Park, SH Sung, HK Kim, DK Moon, JH
Citation
Kh. Kwon et al., Additive oxygen effects in Cl-2 plasma etching of chrome films, J MAT SCI L, 18(15), 1999, pp. 1197-1200
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
18
Issue
15
Year of publication
1999
Pages
1197 - 1200
Database
ISI
SICI code
0261-8028(199908)18:15<1197:AOEICP>2.0.ZU;2-R