In situ resistivity measurements and optical transmission and reflection spectroscopy of electrochemically loaded switchable YHx films

Citation
Es. Kooij et al., In situ resistivity measurements and optical transmission and reflection spectroscopy of electrochemically loaded switchable YHx films, J ELCHEM SO, 146(8), 1999, pp. 2990-2994
Citations number
28
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
146
Issue
8
Year of publication
1999
Pages
2990 - 2994
Database
ISI
SICI code
0013-4651(199908)146:8<2990:ISRMAO>2.0.ZU;2-5
Abstract
We describe an experimental method for in situ resistivity measurements dur ing the electrochemical hydrogen loading of thin, switchable metal hydride films. Using an oxygen-free electrolyte we are able to measure the hydrogen concentration in the films quantitatively and to determine the pressure-co mposition isotherms and the hydrogen concentration dependence of the resist ivity. Furthermore, the optical properties can be investigated by simultane ous transmission and reflection spectroscopy. The power of these in situ me asurements is discussed on the basis of results obtained on YHx films; poss ibilities for additional experiments are briefly described. (C) 1999 The El ectrochemical Society. S0013-4651(98)11-111-4. All rights reserved.