The colorimetric properties of TiN thin films prepared by the facing targets sputtering system

Citation
M. Nose et al., The colorimetric properties of TiN thin films prepared by the facing targets sputtering system, J JPN METAL, 63(7), 1999, pp. 944-948
Citations number
21
Categorie Soggetti
Metallurgy
Journal title
JOURNAL OF THE JAPAN INSTITUTE OF METALS
ISSN journal
00214876 → ACNP
Volume
63
Issue
7
Year of publication
1999
Pages
944 - 948
Database
ISI
SICI code
0021-4876(199907)63:7<944:TCPOTT>2.0.ZU;2-4
Abstract
The purpose of the present work is to confirm the condition for obtaining g old-yellow TiN films with the reactive sputtering method without bias and t o quantitatively evaluate the colorimetric properties of these films. There fore, TSI films were prepared by D.C. reactive sputtering under a no-bias c ondition in the Facing Targets Sputtering (FTS) apparatus, in which a disch arge is maintained at a low gas pressure of less than 0.3 Pa. The color of the films was evaluated by means of the chromaticity coordinates, x and y, and the stimulus value, Y, which is an index of the brightness or luminance factor based on a CIE standard colorimetric system. Gold-yellow TiN films were obtained, and a study of their colorimetric properties has provided th e following conclusions; (i) Even without bias application, a gold-colored TIN film with higher brightness, Y, has been obtained by deposition at an a ppropriate mixing ratio of N-2/Ar and also under lower total gas pressure. (Y=49-53 for the films deposited at 0.14-0.15 Pa) (ii) The colorimetry of t he films is affected by both the mixing ratio and total gas pressure. Parti cularly, the brightness, Y, varied greatly with a change in total gas press ure. (iii) As the total gas pressure was increased, the column size and oxy gen content showed a clear increase. Thus, the films deposited under an atm osphere higher than 0.15 Pa had lower brightness.