Js. Lee et al., In situ ellipsometric study of the formation process of metalorganic vapor-phase epitaxy-grown quantum dots, J VAC SCI B, 17(4), 1999, pp. 1341-1345
Our in situ ellipsometry study of metalorganic vapor-phase epitaxy-grown qu
antum dot (QD) structures showed that the Delta-Psi trajectory of the ellip
sometric signal in Stranski-Krastanow QD growth sharply differs from that i
n layer-by-layer growth. When QD formation starts, a rapidly decreases, inf
lecting the Delta-Psi trajectory. This indicates increased scattering loss,
deduced from increased surface roughness produced in the transition from t
wo- to three-dimensional surface morphology. Ex situ atomic force microscop
y and photoluminescence results correspond well to the ellipsometric signal
at the start of QD formation. Based on these results, we discuss growth-de
pendent QD formation processes such as QD formation onset and growth mode t
ransition. (C) 1999 American Vacuum Society. [S0734-211X(99)02304-5].