Coherent soft x-ray scattering from InP islands on a semiconductor substrate

Citation
M. Adamcyk et al., Coherent soft x-ray scattering from InP islands on a semiconductor substrate, J VAC SCI B, 17(4), 1999, pp. 1728-1732
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
4
Year of publication
1999
Pages
1728 - 1732
Database
ISI
SICI code
1071-1023(199907/08)17:4<1728:CSXSFI>2.0.ZU;2-F
Abstract
Coherent soft x-ray scattering experiments from a semiconductor sample cons isting of InP islands on a smooth semiconductor substrate are described. Th e soft x-ray scattering was performed with 266 eV photons produced by an un dulator source. Using a position sensitive detector, we are able to detect diffusely scattered x rays in the vicinity of the specular reflection, with an in-plane momentum transfer of up to 6 mu m(-1). Using Huygens-Fresnel t heory and atomic force microscope images of the surface structure, we simul ated the scattering assuming a finite lateral coherence length for the inci dent radiation. The lateral coherence length of the incident beam was found to be 20 mu m from a fit to the observed diffraction pattern from a pinhol e. The effect of changes in the surface morphology on the speckle pattern w as simulated to explore the potential of coherent soft x-ray scattering for the study of surface structure dynamics. (C) 1999 American Vacuum Society. [S0734-211X(99)03704-X].