Piezoelectric fields in nitride devices

Citation
Ra. Beach et Tc. Mcgill, Piezoelectric fields in nitride devices, J VAC SCI B, 17(4), 1999, pp. 1753-1756
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
4
Year of publication
1999
Pages
1753 - 1756
Database
ISI
SICI code
1071-1023(199907/08)17:4<1753:PFIND>2.0.ZU;2-R
Abstract
We have calculated the piezoelectric field and charge distribution for vari ous III-nitride heterostructures. Our calculations include strain energy mi nimization and doping effects, and are presented to show the magnitude of p iezoelectric effects in strained layers. We compare our calculated results to device results where available. These include the two-dimensional electr on gas in heterojunction field effect transistors, Schottky diodes with str ained layers for Schottky height engineering, and III-nitride single quantu m wells. Calculations that included energy considerations resulted in good agreement between predicted and observed field and charge distributions for the heterojunction fields-effect transistors structure. (C) 1999 American Vacuum Society. [S0734-211X(99)07104-8].