G. Lucovsky et al., Bonding constraint-induced defect formation at Si-dielectric interfaces and internal interfaces in dual-layer gate dielectrics, J VAC SCI B, 17(4), 1999, pp. 1806-1812
As aggressive scaling of integrated circuits continues into the next centur
y, insulators with dielectric constants higher than SiO2 with different loc
al bonding arrangements will be required to increase gate dielectric capaci
tance in field effect transistor devices. An important issue in semiconduct
or device physics is determining whether differences between the bonding at
(i) Si-SiO2 interfaces and (ii) interfaces between crystalline Si and alte
rnative gate dielectric materials will result in increased densities of ele
ctrically active defects at the alternative dielectric interfaces, thereby
limiting targeted levels of performance and reliability. In particular, it
is important to understand from a chemical bonding perspective why Si-SiO2
interfaces display both low defect densities and high reliability, while ot
her interfaces such as Si-Si3N4 with similar bending chemistry, display def
ect densities that are at least two orders of magnitude higher. Building on
previously established criteria for formation of low defect density glasse
s and thin films, constraint theory is extended to crystalline Si-dielectri
c interfaces that go beyond Si-SiO2 through development of a model that is
based on the average bonding coordination at these interfaces. This approac
h identifies quantitative bonding criteria that distinguish between device-
quality and highly defective interfaces. This extension of constraint theor
y is validated by its application to interfaces between Si and stacked sili
con oxide/nitride dielectrics which demonstrates that as in bulk glasses an
d thin films an average coordination, N-av>3 yields increasingly defective
interfaces. Finally, the universality of this application of constraint the
ory is demonstrated by showing that defect densities scale with overcoordin
ation in the same way in thin films and at interfaces. (C) 1999 American Va
cuum Society. [S0734-211X(99)03904-9].