Highly charged metal ions by placing a ferrocene container inside the ECR ion source

The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of materia l into the source plasma. In the original method, the material container (M IVOC chamber) is mounted externally The flow rate of material depends on th e conductance of the pipe connecting the container to the plasma chamber an d can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material cont ainer into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 mu A of highly charg ed Fe and Ni ions have been produced.