Surface analysis by highly charged ion based secondary ion mass spectrometry

Authors
Schenkel, T Hamza, AV Barnes, AV Newman, MW Machicoane, G Niedermayer, T Hattass, M McDonald, JW Schneider, DH Wu, KJ Odom, RW
Citation
T. Schenkel et al., Surface analysis by highly charged ion based secondary ion mass spectrometry, PHYS SCR, T80A, 1999, pp. 73-75
Citations number
15
Categorie Soggetti
Physics
Journal title
PHYSICA SCRIPTA
ISSN journal
02811847 → ACNP
Volume
T80A
Year of publication
1999
Pages
73 - 75
Database
ISI
SICI code
0281-1847(1999)T80A:<73:SABHCI>2.0.ZU;2-7
Abstract
Electronic sputtering in the interaction of slow (v < 10(6) m/s), highly ch arged ions (e.g., AU(69+)) With Solid surfaces increases secondary ion yiel ds by over two orders of magnitude compared to sputtering with singly charg ed ions. We discuss advantages of highly charged ions for analysis of semic onductors and biomolecular solids in a time-of-flight secondary ion mass sp ectrometry scheme.