Symmetry of molecular H-2 in Si from a uniaxial stress study of the 3618.4cm(-1) vibrational line

Citation
Ja. Zhou et M. Stavola, Symmetry of molecular H-2 in Si from a uniaxial stress study of the 3618.4cm(-1) vibrational line, PHYS REV L, 83(7), 1999, pp. 1351-1354
Citations number
18
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
83
Issue
7
Year of publication
1999
Pages
1351 - 1354
Database
ISI
SICI code
0031-9007(19990816)83:7<1351:SOMHIS>2.0.ZU;2-U
Abstract
Uniaxial stress has been used in conjunction with vibrational spectroscopy to probe the structure and microscopic properties of interstitial H-2 in Si . The stress splitting pattern observed for the 3618.4 cm(-1) line assigned to H-2 is consistent with triclinic (C-1) symmetry of a static center. The piezospectroscopic tensor determined in these experiments suggests a near [100] orientation for the H-2 molecular axis. The low symmetry that has bee n found in these experiments on the 3618.4 cm(-1) line is unexpected.