Production of porous carbon thin films by pulsed laser deposition

Citation
D. Vick et al., Production of porous carbon thin films by pulsed laser deposition, THIN SOL FI, 350(1-2), 1999, pp. 49-52
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
350
Issue
1-2
Year of publication
1999
Pages
49 - 52
Database
ISI
SICI code
0040-6090(19990815)350:1-2<49:POPCTF>2.0.ZU;2-3
Abstract
Pulsed laser deposition (PLD) has been used together with the Glancing Angl e Deposition (GLAD) technique [1,2] for the first time to produce highly po rous structured films. A laser produced carbon plasma and Vapour plume was deposited at a highly oblique incident angle onto rotating Si substrates. r esulting in films exhibiting high bull; porosity and controlled columnar mi crostructure. By varying the substrate rotation rate, the shape of the micr ocolumns can be tailored. These results extend the versatility of the GLAD process to materials not readily deposited by means of traditional physical vapour deposition techniques. (C) 1999 Elsevier Science S.A. All rights re served.