A quantitative determination of the development of texture in thin films

Many electrical and mechanical properties of a material are influenced mark edly by the distribution of the individual grain orientations, i.e, its tex ture. In this paper a new TEM technique is described, along with the analys is used, to identify the texture in a film. A single diffraction pattern fr om a scanned area on a polysilicon film on a cross-sectional TEM specimen i s analysed enabling a semi-quantitative description of the texture of that area in the film. A series of these diffraction patterns from linescans par allel to the film surface is used to show how the texture develops through the film. (C) 1999 Published by Elsevier Science B.V. All rights reserved.