J. Chen et al., Observation of a non Fowler-Nordheim field-induced electron emission phenomenon from chemical vapor deposited diamond films, APPL PHYS L, 75(9), 1999, pp. 1323-1325
A field-induced electron emission phenomenon has been observed from nitroge
n-doped diamond films deposited on molybdenum substrates by microwave plasm
a enhanced chemical vapor deposition using N-2/CH4 as feedstock. Their fiel
d-induced electron emission characteristics, i.e., current-voltage characte
ristics and distribution of emission sites, were studied using the transpar
ent anode imaging technique. A repeatable abrupt change of "on" and "off" s
tates of emission was observed at two corresponding specific fields during
circling of both increasing and decreasing applied gap fields. A plausible
explanation is given to this type of field-induced electron emission phenom
enon, in which a two-layer structure consisting of amorphous carbon and dia
mond is proposed. (C) 1999 American Institute of Physics. [S0003-6951(99)02
535-8].