Mechanical tuning of tunnel gaps for the assembly of single-electron transistors

Citation
Sb. Carlsson et al., Mechanical tuning of tunnel gaps for the assembly of single-electron transistors, APPL PHYS L, 75(10), 1999, pp. 1461-1463
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
10
Year of publication
1999
Pages
1461 - 1463
Database
ISI
SICI code
0003-6951(19990906)75:10<1461:MTOTGF>2.0.ZU;2-C
Abstract
We have fabricated gold single-electron transistors (SETs), operating up to 25 K, with tunnel gaps that could be individually tuned during fabrication . A combination of atomic-force-microscopy manipulation of nanodiscs and in situ electrical measurements was used to form statically stable tunnel gap s between the discs and lithographically defined electrodes. The gap resist ances could be tuned to predetermined values over three orders of magnitude between similar to 1 M Omega and similar to 2 G Omega, corresponding to ga p widths in the range of 3-10 Angstrom. We report on SETs with symmetricall y and asymmetrically coupled islands, i.e., with equal or different tunnel resistances. In the asymmetric SET a distinct Coulomb staircase was observe d. (C) 1999 American Institute of Physics. [S0003-6951(99)01036-0].