An experimental investigation of the relation between operating conditions
and growth rate and morphology is presented for nickel films processed from
nickelocene by MOCVD. It is shown that growth rates up to 1 mu m h(-1) can
be obtained under the investigated conditions. Deposits present a nodular
morphology, the nodules being composed of small (-20 nm) crystallites, Depo
sition is favored at temperatures between 160 degrees C and 180 degrees C,
and at pressures higher than 100 torr, with a high hydrogen partial pressur
e. This parametric window is delimited by the decrease of the dissociative
adsorption of hydrogen on the surface and by the increase of the desorption
of nickelocene.