MOCVD-processed Ni films from nickelocene. Part II: Carbon content of the deposits

Citation
L. Brissonneau et al., MOCVD-processed Ni films from nickelocene. Part II: Carbon content of the deposits, CHEM VAPOR, 5(4), 1999, pp. 143-149
Citations number
38
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
5
Issue
4
Year of publication
1999
Pages
143 - 149
Database
ISI
SICI code
0948-1907(199908)5:4<143:MNFFNP>2.0.ZU;2-T
Abstract
In this study, results are reported on the composition and the electrical a nd magnetic properties of thin films of nickel deposited by metal-organic C VD (MOCVD) from nickelocene. It was found that the films contain carbon, wh ose content decreases with increasing deposition pressure and hydrogen flow rate and with decreasing molar fraction of the precursor. Ferromagnetic pr operties, namely saturation magnetization, Curie temperature, and also elec trical conductivity of the films decrease with increasing carbon content. T he evolution of the saturation magnetization M-s of the films with measurem ent temperature follows Bloch's law. Carbon is found in the films in differ ent forms, namely carbidic (interstitial), aliphatic, or cyclic. Deposition of these forms is discussed and is correlated with the variations of the p roperties of the films.