Ultrahigh efficiency obtained with GaAs-on-insulator MESFET technology

Citation
Tj. Jenkins et al., Ultrahigh efficiency obtained with GaAs-on-insulator MESFET technology, IEEE J SOLI, 34(9), 1999, pp. 1239-1245
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SOLID-STATE CIRCUITS
ISSN journal
00189200 → ACNP
Volume
34
Issue
9
Year of publication
1999
Pages
1239 - 1245
Database
ISI
SICI code
0018-9200(199909)34:9<1239:UEOWGM>2.0.ZU;2-B
Abstract
Significant results of measurement and calculation of power-added efficienc y (PAE) and drain efficiency are presented for MESFET's that use GaAs-on-in sulator. Ultrahigh PAE of 89% was obtained at 8 GHz with a gain of 9.6 dB u sing a 3-V supply. When the voltage was increased to 4 V, the peak PAE was 93% at 210 mW/mm with 9.2-dB gain. The ideal current-voltage characteristic s with practically zero leakage current and large transconductance near pin choff yielded PAE values approaching the theoretical limits of overdriven o peration, The application of conventional assumptions concerning drain effi ciency is discussed relative to devices that approach these theoretical lim its. Also discussed are the pitfalls of various figures of merit of efficie ncy when applied to these devices, Hence, there are two types of technical barriers associated with very-high-efficiency devices: the physical realiza tion and their characterization.