COMPUTER MODELING THE DEPOSITION OF NANOSCALE THIN-FILMS

The embedded atom method for simulating the deposition of thin films w ith nanoscale dimensions will be reviewed and this technique will be c ompared with some of the other methods for molecular dynamics simulati on. Recent results of molecular dynamics simulations that relate to th e fabrication of nanostructured materials will be presented. Simulatio ns include the low temperature deposition of Pt and Cu onto Cu substra tes with energetic incoming atoms as occurs in many deposition process es such as sputter or ion beam deposition. The effects of heat of solu tion, incident energy, and incident momentum on the mixing of atoms an d the formation of interstitials in the substrate will be discussed. ( C) 1997 Acta Metallurgica Inc.