Nonuniformity of thickness of films obtained by ion sputtering in the Penning discharge

Authors
Kozlovskii, LV Tamanis, E
Citation
Lv. Kozlovskii et E. Tamanis, Nonuniformity of thickness of films obtained by ion sputtering in the Penning discharge, INSTR EXP R, 42(4), 1999, pp. 578-581
Citations number
8
Categorie Soggetti
Instrumentation & Measurement
Journal title
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES
ISSN journal
00204412 → ACNP
Volume
42
Issue
4
Year of publication
1999
Pages
578 - 581
Database
ISI
SICI code
0020-4412(199907/08)42:4<578:NOTOFO>2.0.ZU;2-W
Abstract
The nonuniformity of thickness of films obtained by ion sputtering in the P enning discharge is evaluated by calculations and measured experimentally. The calculated and experimental data agree if the angular distribution of t he sputtered particles used in calculations has the form (n + 1/2 pi)cos(n) theta, where n = 0.25-1, depending on the distance to the substrates. The d ependence observed is explained by the effect of collisions of the sputtere d Al atoms with Xe atoms of the working gas at a pressure of 7 x 10(-4) Tor r.