Second-harmonic generation in reactive-ion etched N ' ethyl N-ethanol-4-(nitrophenylazo)phenylamino polymer waveguides at telecommunication wavelengths
Wr. Cho et al., Second-harmonic generation in reactive-ion etched N ' ethyl N-ethanol-4-(nitrophenylazo)phenylamino polymer waveguides at telecommunication wavelengths, J APPL PHYS, 86(6), 1999, pp. 2941-2944
Second-harmonic generation using modal dispersion phase matching has been d
emonstrated in reactive-ion etched waveguides based on the organic nonlinea
r polymer poly (methyl methacrylate)-Disperse Red 1 [N' ethyl N-ethanol-4-(
nitrophenylazo)phenylamino]. The measured propagation losses were 6 dB/cm a
t the fundamental and 10 dB/cm at the second-harmonic wavelength, dramatica
lly less than we obtained previously for the harmonic in photobleached wave
guides. A figure of merit of eta=0.1%/W for second-harmonic generation was
obtained with a modest nonlinearity of 3 pm/V at 1607 nm in a 2 mm long wav
eguide. (C) 1999 American Institute of Physics. [S0021-8979(99)06318-5].