Electronic states and effective negative electron affinity at cesiated p-GaN surfaces

Authors
Citation
Ci. Wu et A. Kahn, Electronic states and effective negative electron affinity at cesiated p-GaN surfaces, J APPL PHYS, 86(6), 1999, pp. 3209-3212
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
6
Year of publication
1999
Pages
3209 - 3212
Database
ISI
SICI code
0021-8979(19990915)86:6<3209:ESAENE>2.0.ZU;2-D
Abstract
The electronic structure of, and the effects of cesium (Cs) and oxygen (O) adsorption on, the p-GaN(001) surface are investigated via photoemission sp ectroscopy. Bulk- and surface-sensitive photoemission measurements, and oxy gen exposure of clean surfaces, demonstrate the existence of filled surface states which extend similar to 0.6 eV above the valence band maximum. The valence band maximum measured after the removal of the surface states gives a downward band bending and electron affinity equal to 1.2 +/- 0.2 and 3.3 +/- 0.2 eV, respectively. The surface dipole layer induced by exposure to oxygen followed by Cs deposition lowers the vacuum level by 2.8 +/- 0.3 eV with respect to the valence and conduction band edges. Under these conditio ns, the vacuum level is approximately 0.7 eV below the conduction band mini mum of the bulk, corresponding to the effective negative electron affinity at this surface. (C) 1999 American Institute of Physics. [S0021-8979(99)044 18-7].