Crystal growth of Gd5Si4, Gd5Si2Ge2 and Gd5Ge4 was performed using the Czoc
hralski method from the levitated melt. Single crystalline plates were obta
ined for all compounds. The Berg-Barrett topography revealed the existence
of stress within the plates. The surface of the plates shows a regular syst
em of lines or channels, which is independent of the growth steps and the s
tress structure. The auger electron spectroscopy investigation of that stru
cture revealed the increase of gadolinium and oxygen contents in the area o
f lines, which had the width of about 2 mu m. We suppose this concentration
of impurities may take place along dislocations, which could be formed dur
ing the structural transition at high temperature. (C) 1999 Elsevier Scienc
e B.V, All rights reserved.