Copper base binary alloys have been irradiated with 1 MeV electrons using a
high-voltage electron microscope in order to study solute-point defect int
eractions and their effects on defect structure development. This paper rep
orts results on Cu-Pd and Cu-Pt, and compares them with previous results on
Cu-Ni, -Si, -Ge, and -Sn. Pd and Pt have a similar volume size factor as G
e (about +30%), and they belong to the same group as Ni (an undersize solut
e) in the periodic table of elements. At lower temperatures, the addition o
f Pd and Pt was found to stabilize interstitial-type dislocation loops, but
did not increase the loop number density as drastically as the addition of
Si, Ge, or Sn, Addition of 2 at.% of Pd or Pt resulted in the formation of
stacking fault tetrahedra (SFTs) stable up to higher temperatures, and als
o voids between 373 It and 523 It. 0.3 at.% of Pd or Pt, however, did not i
nduce either stable SFTs or voids. In contrast, addition of 0.3 at.% Si, Ge
, and Sn was found to stabilize SFTs. These results suggest that solute-poi
nt defect interactions are not characterized only by atomic volume size fac
tor.