Citation
Sy. Zhang et al., Dependence of adhesion of films of telluride upon its microstructure, J INF M W, 18(4), 1999, pp. 327-331
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF INFRARED AND MILLIMETER WAVES
ISSN journal
10019014
→ ACNP
Volume
18
Issue
4
Year of publication
1999
Pages
327 - 331
Database
ISI
SICI code
1001-9014(199908)18:4<327:DOAOFO>2.0.ZU;2-O
Abstract
Microstructures of single layer of telluride and telluride/ZnS multilayer o
n Si and Ge substrates were investigated by XRD and TEM. The correlation be
tween adhesion and microstructure of layers was given.