PREPARATION OF HIGH-QUALITY EPITAXIAL SIL ICON LAYERS BY THE GAS-PHASE EPITAXY TECHNIQUE

Citation
Na. Samoilov et al., PREPARATION OF HIGH-QUALITY EPITAXIAL SIL ICON LAYERS BY THE GAS-PHASE EPITAXY TECHNIQUE, Zurnal tehniceskoj fiziki, 67(2), 1997, pp. 132-133
Citations number
4
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00444642
Volume
67
Issue
2
Year of publication
1997
Pages
132 - 133
Database
ISI
SICI code
0044-4642(1997)67:2<132:POHESI>2.0.ZU;2-F