The effect of carbon mesh on the electric property of alpha-carbon films

Authors
Kim, DW Park, JH Choi, SS Cho, J
Citation
Dw. Kim et al., The effect of carbon mesh on the electric property of alpha-carbon films, MAT SCI E B, 64(1), 1999, pp. 29-32
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
64
Issue
1
Year of publication
1999
Pages
29 - 32
Database
ISI
SICI code
0921-5107(19990915)64:1<29:TEOCMO>2.0.ZU;2-P
Abstract
The solid state amorphous carbon films have been deposited by the method of plasma enhanced chemical vapor deposition (PECVD). The structural features have been characterized using FT-IR spectroscopy, Raman scattering, and I- V measurement. The film is considered to be composed of microcrystalline di amond domains and graphite-like carbon domains, which are interconnected by hydrogenated sp(3) tetrahedral carbons. In I-V measurement, the sudden inc rease of current at a certain critical voltage has been observed and this p henomenon is understood to be due to the effect of charge tunneling through carbon mesh between graphite-like domains. (C) 1999 Elsevier Science S.A. All rights reserved.