Equilibrium crystal shapes for 6H AND 4H SiC grown on non-planar substrates

Growth of 6H and 4H SIC has been performed on Si-face substrates with etche d stripe mesas under low supersaturation conditions (which is obtained by k eeping the C:Si ratio in the gas phase low) at the two different growth tem peratures of 1480 and 1620 degrees C. The growth around the mesas was inves tigated by scanning electron microscopy and the facets which appear around the mesas could be identified as low index lattice planes. The difference i n growth rate between these lattice planes was found to be less than +/- 25 %. Modified polar Wulff plots are used to illustrate the growth rate in the different lattice directions, and could also be used to predict the growth habit for different geometries. As expected, the average growth rate is la rger on the {11 (2) over bar n} than on the {1 (1) over bar n} planes, but slow and fast growing planes exist for both sets of planes. Generally the g rowth rate is larger for planes with high n, and for the {1 (1) over bar 0n } planes it is found that a slow growth rate could be correlated with a lar ger percentage of C ad-atoms to the plane. At the lower growth temperature a larger difference in growth rate between the fast and slow growing planes could be observed: probably due to a larger influence of the surface energ ies under these conditions. (C) 1999 Elsevier Science S.A. All rights reser ved.