The homoepitaxial growth of 6H-SiC layers has been performed using methane
and silane as active gas sources. Voltage-capacitance measurements and resu
lts of i-DLTS spectroscopy characterized the epilayers. In accordance of th
e C/Si ratio in the gas phase the epitaxial layers exhibit n- or p-type con
ductivity. The dependence of N-D - N-A or N-A - N-D = F(Si/C) in uniutentio
nally doped layers is, as we suggest, connected with structural defects. (C
) 1999 Elsevier Science S.A. All rights reserved.