Reflection and transmission X-ray topographic study of a SiC crystal and epitaxial wafer

Citation
H. Yamaguchi et al., Reflection and transmission X-ray topographic study of a SiC crystal and epitaxial wafer, MAT SCI E B, 61-2, 1999, pp. 221-224
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
61-2
Year of publication
1999
Pages
221 - 224
Database
ISI
SICI code
0921-5107(19990730)61-2:<221:RATXTS>2.0.ZU;2-5
Abstract
Defects in commercially available silicon carbide (SiC) wafers have been in vestigated by X-ray topography and optical microscopy. Dots appearing in tr ansmission topographs are identified as a screw dislocation running through the [0001] direction by a comparative observation of the reflection topogr aphs from the front and rear sides. In the peripheral region, these dots ap pear with high density and accompany large strain fields at the edge, which are related with the dislocations in the basal plane emanating from the do ts and connecting them and large holes with diameters of about 10-20 mu m o pening at the epilayer surface. These large strain fields are considered to originate from the large Burgers vector associating with the screw disloca tions. (C) 1999 Elsevier Science S.A. All rights reserved.