A spatially and time-resolved free carrier absorption method is applied to
quantify surface recombination losses as compared to the bulk in 4H- and 6H
-SiC structures. The observed carrier lifetime variation is discussed in te
rms of crystalline quality, top-surface properties and junction effects at
the epilayer-substrate interface. Surface recombination parameters in epila
yers with differently processed surfaces are extracted from fitting experim
ental data with numerical simulations. The as-grown bare epilayer is charac
terized by 10(4) cm s(-1) surface recombination velocity. Mechanical polish
ing increases this parameter to 5 x 10(5) cm s(-1). No noticeable passivati
on of GH-SIC surface by an oxide film is observed, whereas an increase of t
he surface recombination velocity up to 105 cm s(-1) has been detected afte
r dry oxidation of 4H-SiC. (C) 1999 Elsevier Science S.A. All rights reserv
ed.