Optical investigation of residual doping species in 6H and 4H-SIC layers grown by chemical vapor deposition

Citation
E. Neyret et al., Optical investigation of residual doping species in 6H and 4H-SIC layers grown by chemical vapor deposition, MAT SCI E B, 61-2, 1999, pp. 253-257
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
61-2
Year of publication
1999
Pages
253 - 257
Database
ISI
SICI code
0921-5107(19990730)61-2:<253:OIORDS>2.0.ZU;2-C
Abstract
We report the results of a series of optical investigations performed on bo th 6H and 4H epitaxial layers grown at low rate (approximate to 1 mu m h(-1 )) in a home-made cold-wall chemical vapor deposition (CVD) reactor. To kee p the level of contamination as low as possible, attempts have been made to investigate the origin of residual dopants. In this way, we have found tha t aluminum comes only from the use of uncoated graphite susceptors. When us ing a SIC coated susceptor, we have found that the protection is only effec tive for about ten runs. (C) 1999 Elsevier Science S.A. All rights reserved .