Structural changes induced by KrF excimer laser photons in H-2-loaded Ge-doped SiO2 glass

Citation
M. Fujimaki et al., Structural changes induced by KrF excimer laser photons in H-2-loaded Ge-doped SiO2 glass, PHYS REV B, 60(7), 1999, pp. 4682-4687
Citations number
33
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
7
Year of publication
1999
Pages
4682 - 4687
Database
ISI
SICI code
0163-1829(19990815)60:7<4682:SCIBKE>2.0.ZU;2-8
Abstract
Photochemical reactions related to the Ge lone-pair center (GLPC) that an i nduced by KrF excimer laser photons in H-2-loaded Ge-doped SiO2 glass have been investigated. Without the H-2 loading, the Ge electron center (GEC) an d the positively charged GLPC were induced by the laser irradiation. In the H-2-loaded sample, the GEC, the Ge E' center, and the germyl radical (GR) were induced by the irradiation, while the positively charged GLPC was not observed after the irradiation. If the H-2-loaded sample was thermally anne aled after the photon irradiation, the concentration of the photo-induced G EC decreased monotonically with an increase in the annealing temperature. O n the other hand, the concentration of the GR increased up to the annealing temperature of 160 degrees C, and it decreased at higher temperatures. Wit hout the pre-irradiation, the induction of the GR was not observed even in the H-2-loaded sample. From these results, it is concluded that the positiv ely charged GLPC is terminated with a hydrogen atom in the H-2-loaded sampl e and then becomes the GR by trapping an electron thermally released from t he GEC. [S0163-1829(99)05631-3].