We have studied the atomic structure of up to one monolayer of Te on Si(001
) using first-principles total-energy calculations. A low amount of Te atom
s deposited on Si(001) is adsorbed on top of symmetric Si dimers. This conf
iguration is preferred to adsorption on cave sites between Si dimers. For t
he one-monolayer coverage the most favorable structure corresponds to adsor
ption of Te atoms on near bridge sites. The (1x1) symmetry is broken by a s
mall shift of Te atoms from perfect bridge positions, giving rise to a slig
htly disordered surface. This is a way to relieve the strain due to the siz
e difference between Te and Si atoms. Missing Te rows is another way, and i
t is the one observed experimentally. We have calculated the atomic structu
re of the surface when one out of every five Te rows is missing. Two possib
ilities were examined. The most favorable corresponds to missing Te rows or
thogonal to original Si rows. In all cases, our results are in good agreeme
nt with experimental data. [S0163-1829(99)01031-0].